Mask Design Engineer

About this assessment

This assessment is designed for engineers and designers looking to deepen their expertise in advanced semiconductor design and layout techniques. It covers critical aspects of modern chip development, starting with the fundamentals of ESD structure mask design and extending into sophisticated analog circuit layout concepts within submicron CMOS technologies. Participants will explore practical applications using Cadence Virtuoso techniques, gaining hands-on experience with industry-standard verification tools. Whether you're refining your technical skillset or expanding your knowledge of state-of-the-art methodologies in circuit design, this assessment provides a comprehensive challenge that mirrors real-world scenarios, ensuring you stay ahead in today’s competitive technological landscape.

This section tests advanced concepts and subtle aspects of mask design, layout intricacies, and ESD robustness in semiconductor structures. The questions delve into mask alignment, process variations, density control, and simulation accuracy to ensure deep understanding of ESD structures.

This section covers 10 multiple choice questions addressing advanced topics in analog circuit layout techniques in submicron CMOS technologies. Topics include proximity effects, systematic mismatch mitigation, guard rings, common-centroid layouts, dummy structures, stress gradients, precision vias, differential pair symmetry, substrate noise coupling, and double patterning challenges.

This section will test your ability to use Cadence Virtuoso for advanced simulation, layout extraction, and customization tasks using SKILL and integrated tool suites. Questions cover topics including netlist generation, parameter sweeps, RF design simulation, hierarchical design management, script automation, waveform analysis, and noise simulation.

This section tests advanced understanding of verification tools, specifically Dracula, Hercules, Calibre, and Primeyield. Questions target intricate details and integration challenges in these tools.